JPH076718Y2 - 静電吸着装置 - Google Patents
静電吸着装置Info
- Publication number
- JPH076718Y2 JPH076718Y2 JP2963689U JP2963689U JPH076718Y2 JP H076718 Y2 JPH076718 Y2 JP H076718Y2 JP 2963689 U JP2963689 U JP 2963689U JP 2963689 U JP2963689 U JP 2963689U JP H076718 Y2 JPH076718 Y2 JP H076718Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrostatic attraction
- wafer
- electrode
- electrostatic
- power source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001179 sorption measurement Methods 0.000 title claims description 7
- 239000012212 insulator Substances 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 12
- 230000003068 static effect Effects 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 4
- 238000001312 dry etching Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 24
- 239000002184 metal Substances 0.000 description 4
- 238000001514 detection method Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000004043 responsiveness Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Jigs For Machine Tools (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2963689U JPH076718Y2 (ja) | 1989-03-15 | 1989-03-15 | 静電吸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2963689U JPH076718Y2 (ja) | 1989-03-15 | 1989-03-15 | 静電吸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02122597U JPH02122597U (en]) | 1990-10-08 |
| JPH076718Y2 true JPH076718Y2 (ja) | 1995-02-15 |
Family
ID=31254017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2963689U Expired - Lifetime JPH076718Y2 (ja) | 1989-03-15 | 1989-03-15 | 静電吸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH076718Y2 (en]) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3233482B2 (ja) * | 1993-03-15 | 2001-11-26 | 東芝機械株式会社 | 気相成長装置 |
| JP2007150351A (ja) * | 2007-02-15 | 2007-06-14 | Toto Ltd | 静電チャック |
| JP2009170509A (ja) * | 2008-01-11 | 2009-07-30 | Hitachi High-Technologies Corp | ヒータ内蔵静電チャックを備えたプラズマ処理装置 |
-
1989
- 1989-03-15 JP JP2963689U patent/JPH076718Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02122597U (en]) | 1990-10-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |